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The 32 nanometer (32 nm) node is the step following the 45 nanometer process in CMOS semiconductor device fabrication. "32 nanometer" refers to the average half-pitch (i.e., half the distance between identical features) of a memory cell at this technology level. Intel and AMD both produced commercial microchips using the 32 nanometer process in the early 2010s. IBM and the Common Platform also developed a 32 nm high-k metal gate process.〔Intel (Architecture & Silicon). (Gate Dielectric Scaling for CMOS: from SiO2/PolySi to High-K/Metal-Gate ). White Paper. Intel.com. Retrieved 18 June 2013.〕 Intel began selling its first 32 nm processors using the Westmere architecture on 7 January 2010. The 32 nm process was superseded by commercial 22 nm technology in 2012.〔("Report: Intel Scheduling 22 nm Ivy Bridge for April 2012" ). Tom'sHardware.com. 26 November 2011. Retrieved 5 December 2011.〕〔("Intel's Ivy Bridge chips launch using '3D transistors'" ). BBC. 23 April 2012. Retrieved 18 June 2013.〕 ==Technology demos== Prototypes using 32 nm technology first emerged in the mid-2000s. In 2004, IBM demonstrated a 0.143 μm2 SRAM cell with a poly gate pitch of 135 nm, produced using electron-beam lithography and photolithography on the same layer. It was observed that the cell's sensitivity to input voltage fluctuations degraded significantly at such a small scale.〔D. M. Fried et al., IEDM 2004.〕 In October 2006, the Interuniversity Microelectronics Centre (IMEC) demonstrated a 32 nm flash patterning capability based on double patterning and immersion lithography.〔("IMEC demonstrates feasibility of double patterning immersion litho for 32nm node" ). PhysOrg.com. 18 October 2006. Retrieved 17 December 2011.〕 The necessity of introducing double patterning and hyper-NA tools to reduce memory cell area offset some of the cost advantages of moving to this node from the 45 nm node. TSMC similarly used double patterning combined with immersion lithography to produce a 32 nm node 0.183 μm2 six-transistor SRAM cell in 2005.〔H-Y. Chen et al., Symp. on VLSI Tech. 2005.〕 Intel Corporation revealed its first 32 nm test chips to the public on 18 September 2007 at the Intel Developer Forum. The test chips had a cell size of 0.182 μm2, used a second-generation high-k gate dielectric and metal gate, and contained almost two billion transistors. 193 nm immersion lithography was used for the critical layers, while 193 nm or 248 nm dry lithography was used on less critical layers. The critical pitch was 112.5 nm.〔F. T. Chen (2002). ''Proc. SPIE''. Vol. 4889, no. 1313.〕 In January 2011, Samsung completed development of what it claimed was the industry's first DDR4 DRAM module using a process technology with a size between 30 nm and 39 nm. The module could reportedly achieve data transfer rates of 2.133 Gbit/s at 1.2V, compared to 1.35V and 1.5V DDR3 DRAM at an equivalent 30 nm-class process technology with speeds of up to 1.6 Gbit/s. The module used pseudo open drain (POD) technology, specially adapted to allow DDR4 DRAM to consume just half the current of DDR3 when reading and writing data. 抄文引用元・出典: フリー百科事典『 ウィキペディア（Wikipedia）』 ■ウィキペディアで「32 nanometer」の詳細全文を読む スポンサード リンク
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